Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering
- 1 October 1993
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 59 (1-3) , 177-182
- https://doi.org/10.1016/0257-8972(93)90079-4
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Macroparticle contamination in cathodic arc coatings: generation, transport and controlSurface and Coatings Technology, 1992
- Reluctant etchability of dielectric Al2O3 films sputtered in water vapor and ArO2 environmentsThin Solid Films, 1991
- The effect of target-substrate coupling on reactive direct current magnetron sputteringSurface and Coatings Technology, 1989
- Reactive d.c. high-rate sputtering as production technologySurface and Coatings Technology, 1987