A Pulse Method for Measuring the Injection Ratio of Metal-Semiconductor Contacts
- 1 July 1955
- journal article
- Published by IOP Publishing in Proceedings of the Physical Society. Section B
- Vol. 68 (7) , 447-452
- https://doi.org/10.1088/0370-1301/68/7/306
Abstract
No abstract availableThis publication has 5 references indexed in Scilit:
- The variation of point contact injection ratio with emitter currentPhysica, 1954
- Current Multiplication Processes in n-Type Germanium Point-Contact TransistorsProceedings of the Physical Society. Section B, 1954
- Measurement of Minority Carrier Lifetime and Contact Injection Ratio on Transistor MaterialsProceedings of the Physical Society. Section B, 1954
- The Mobility and Life of Injected Holes and Electrons in GermaniumPhysical Review B, 1951
- Hole Injection in Germanium-Quantitative Studies and Filamentary Transistors*Bell System Technical Journal, 1949