Photo‐assisted chemical vapor deposition of gallium sulfide thin films
- 1 November 1995
- journal article
- Published by Wiley in Chemical Vapor Deposition
- Vol. 1 (3) , 75-78
- https://doi.org/10.1002/cvde.19950010303
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Synthesis and Characterization of Some Mixed Alkyl Thiocarbamates of Gallium and Indium, Precursors for III/VI Materials: The X-ray Single-Crystal Structures of Dimethyl- and Diethylindium DiethyldithiocarbamateChemistry of Materials, 1995
- Vapor Phase Laser Photochemistry and Determination by Electron Diffraction of the Molecular Structure of [(tBu)GaS]4: Evidence for the Retention of the Ga4S4 Cubane Core during the MOCVD Growth of Cubic GaSOrganometallics, 1995
- Gallium Arsenide Transistors: Realization Through a Molecularly Designed InsulatorScience, 1994
- Chemical vapor deposition of gallium sulfide: phase control by molecular designChemistry of Materials, 1993
- Electronic passivation of n- and p-type GaAs using chemical vapor deposited GaSApplied Physics Letters, 1993
- Enhancement of photoluminescence intensity of GaAs with cubic GaS chemical vapor deposited using a structurally designed single-source precursorApplied Physics Letters, 1993
- Surface passivation of GaAs with P2S5-containing solutionsJournal of Applied Physics, 1992
- The preparation of (Al2O3)x(SiO2)y thin films using [al(OSiEt3)3]2 as a single‐source precursorAdvanced Materials for Optics and Electronics, 1992
- Chemical vapor deposition of cubic gallium sulfide thin films: a new metastable phaseChemistry of Materials, 1992
- New and unified model for Schottky barrier and III–V insulator interface states formationJournal of Vacuum Science and Technology, 1979