The effects of electrostatic, molecular drag and gravitational forces on the behavior of particle clouds in an RF discharge
- 1 April 1994
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Plasma Science
- Vol. 22 (2) , 122-127
- https://doi.org/10.1109/27.279014
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- Effects of particle clouds in a plasma etch system on silicon dioxide wafer contaminationJournal of Vacuum Science & Technology A, 1994
- Physical properties of contamination particle traps in a process plasmaJournal of Applied Physics, 1993
- The dependence of contamination particle traps on wafer material and topographyJournal of Applied Physics, 1992
- Plasma particulate contamination control. I. Transport and process effectsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Electrostatic trapping of contamination particles in a process plasma environmentApplied Physics Letters, 1991
- The electrostatic nature of contaminative particles in a semiconductor processing plasmaJournal of Vacuum Science & Technology A, 1991
- Measurements of charge on submicron particles generated in a sputtering processJournal of Applied Physics, 1990
- I n s i t u laser diagnostic studies of plasma-generated particulate contaminationJournal of Vacuum Science & Technology A, 1989
- Spatial dependence of particle light scattering in an rf silane dischargeApplied Physics Letters, 1985
- Resistance to the Motion of a Small Sphere Moving Through a GasMonthly Notices of the Royal Astronomical Society, 1965