Physical properties of contamination particle traps in a process plasma
- 15 May 1993
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 73 (10) , 4785-4793
- https://doi.org/10.1063/1.353843
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
- Plasma particulate contamination control. I. Transport and process effectsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1991
- Direct visual observation of powder dynamics in rf plasma-assisted depositionApplied Physics Letters, 1991
- Rastered laser light scattering studies during plasma processing: Particle contamination trapping phenomenaJournal of Vacuum Science & Technology A, 1991
- The electrostatic nature of contaminative particles in a semiconductor processing plasmaJournal of Vacuum Science & Technology A, 1991
- In situ plasma contamination measurements by HeNe laser light scattering: A case studyJournal of Vacuum Science & Technology A, 1990
- I n s i t u laser diagnostic studies of plasma-generated particulate contaminationJournal of Vacuum Science & Technology A, 1989
- Particle densities in radio-frequency discharges of silaneThe Journal of Physical Chemistry, 1988
- Particle number densities by light-scattering fluctuation analysisThe Journal of Physical Chemistry, 1988
- Langmuir probe technique for plasma parameter measurement in a medium density dischargeReview of Scientific Instruments, 1986
- Theory of a double sheath between two plasmasProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1971