Preparation of La-Modified Lead Titanate Thin Films by Rf-Magnetron Sputtering Method and Their Pyroelectric Properties
- 1 February 1995
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 34 (2B) , L233-235
- https://doi.org/10.1143/jjap.34.l233
Abstract
High-quality La-modified lead titanate (PLT) films were grown on MgO substrates by an rf-magnetron sputtering method. In this method, intermittent deposition was realized by periodical repetition of deposition and nondeposition processes with rotation of the substrate holder. The difference between intermittent and continuous methods was examined in terms of the crystal structure and the pyroelectric properties of the films. Intermittent deposition was found to enhance the horizontal grain growth of the films. Excellent PLT films with a high pyroelectric coefficient of 5.0×10-8 C/cm2·K and low dielectric constant of 185 were reproducibly obtained by this method.Keywords
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