Influence of deposition rate on properties of reactively sputtered TiNx films
- 1 January 1988
- Vol. 38 (6) , 459-461
- https://doi.org/10.1016/0042-207x(88)90588-x
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
- TiNx coatings prepared by d.c. reactive magnetron sputteringThin Solid Films, 1986
- Ti–N phases formed by reactive ion platingJournal of Vacuum Science & Technology A, 1985
- Structure and properties of TiN coatingsThin Solid Films, 1985
- The microstructure of reactively sputtered Ti-N films containing the Ti2N phaseActa Metallurgica, 1985
- The microstructure of reactively sputtered Ti-N filmsThin Solid Films, 1983
- Optical constants and spectral selectivity of titanium carbonitridesThin Solid Films, 1982