Incoherent radiative processing of titanium silicides
- 1 August 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 118 (2) , 155-162
- https://doi.org/10.1016/0040-6090(84)90067-1
Abstract
No abstract availableThis publication has 8 references indexed in Scilit:
- Formation of nickel and palladium silicides by a short-pulse light-flash and its application in the metallization of solar cellsSolid-State Electronics, 1983
- Short Time AnnealingJournal of the Electrochemical Society, 1983
- Processing of titanium films on silicon using a multiscanned electron beamElectronics Letters, 1982
- Co2Si, CrSi2, ZrSi2 and TiSi2 formation studied by a radioactive 31Si marker techniqueThin Solid Films, 1982
- Titanium and nickel silicide formation after Q-switched laser and multiscanning electron beam irradiationJournal of Applied Physics, 1982
- Thin film interaction between titanium and polycrystalline siliconJournal of Applied Physics, 1980
- Growth Kinetics Observed in the Formation of Metal Silicides on SiliconApplied Physics Letters, 1972
- Gettering of Gas by TitaniumJournal of Applied Physics, 1955