Process Modeling for Photoresist Development and Design of DLR/sd (Double-Layer Resist by a Single Development) Process
- 1 May 1987
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
- Vol. 6 (3) , 403-409
- https://doi.org/10.1109/tcad.1987.1270285
Abstract
This paper describes a new simple process model for photoresist development. The model includes the consideration of chemical reactions between a photoresist and a developer, and takes the developer concentration dependence into account. The model is applied to the design of practical photo-lithography processes to determine development conditions. Through the introduction of the model-based lithographic simulations, the multilayer resist process has been successfully designed and has obtained satisfactory patterns.Keywords
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