The Effects of Small Concentrations of Oxygen in RTP Annealing of Low Energy Boron, BF² and Arsenic Ion Implants

Publisher Website

1 January 1998

journal article
Published by Springer Nature in MRS Proceedings

Vol. 525
https://doi.org/10.1557/proc-525-263

Abstract

No abstract available

Keywords

This publication has 3 references indexed in Scilit:

Simulation of Rapid Thermal Annealed Boron Ultra-Shallow Junctions in Inert and Oxidizing Ambient
MRS Proceedings, 1998
Characterization of ultra-shallow junctions with tapered groove profilometry and other techniques
Published by AIP Publishing ,1998
Dose-rate effects on the formation of ultra-shallow junctions with low-energy B+ and BF2+ ion implants
Thin Solid Films, 1997