Dose-rate effects on the formation of ultra-shallow junctions with low-energy B+ and BF2+ ion implants
- 1 October 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 308-309, 562-569
- https://doi.org/10.1016/s0040-6090(97)00494-x
Abstract
No abstract availableKeywords
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