Plasma developable positive UV -resists
- 1 September 1983
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 1 (1) , 29-40
- https://doi.org/10.1016/0167-9317(83)90010-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Photoresist development by plasmaPolymer Engineering & Science, 1980
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- NATURE OF THE EXCITED TRIPLET STATES IN THE PHOTOLYSIS OF O-ACYLOXIMESChemistry Letters, 1975