Electronic properties of ion-bombarded evaporated germanium and silicon
- 24 December 1978
- journal article
- Published by IOP Publishing in Journal of Physics C: Solid State Physics
- Vol. 11 (24) , 4983-4996
- https://doi.org/10.1088/0022-3719/11/24/027
Abstract
Experimental results are presented for the electrical conductivity, optical absorption and photoconductivity of evaporated germanium and silicon, bombarded at 14K with self-ions and measured in situ. The conductivity in the ohmic region follows the Mott T-1/4 law (1969) extremely well, with ion bombardment increasing the conductivity by many orders of magnitude and decreasing the slope of the T-1/4 plots consistently. By using the hopping conduction model of Apsley and Hughes (1975), it is possible to determine independently the radius and density of the localised states at the Fermi level.Keywords
This publication has 23 references indexed in Scilit:
- Some remarks on the structure and formation of thin amorphous filmsAIP Conference Proceedings, 1976
- Temperature- and field-dependence of hopping conduction in disordered systems, IIPhilosophical Magazine, 1975
- Electrical conductivity in disordered systemsSolid State Communications, 1973
- Electrical conduction in heavily doped germaniumPhilosophical Magazine, 1972
- Electrical conduction in evaporated amorphous silicon filmsJournal of Non-Crystalline Solids, 1972
- High-Resolution Electron Microscope Observation of Voids in Amorphous GePhysical Review Letters, 1971
- Hopping Conductivity in Disordered SystemsPhysical Review B, 1971
- Structural, Optical, and Electrical Properties of Amorphous Silicon FilmsPhysical Review B, 1970
- ESR AND OPTICAL ABSORPTION STUDIES OF ION-IMPLANTED SILICONApplied Physics Letters, 1970
- Polarons in crystalline and non-crystalline materialsAdvances in Physics, 1969