AES sputtering depth profile analysis of C/W layered synthetic microstructures
- 1 April 1987
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 28 (2) , 93-102
- https://doi.org/10.1016/0169-4332(87)90056-0
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Superficial composition in binary solid solutions A(B): Drastic effect of pure element surface tensionsSurface Science, 1985
- Auger and depth profile analysis of synthetic crystals for dispersion of soft x-raysApplications of Surface Science, 1984
- Metallic multilayers for x rays using classical thin-film theoryApplied Optics, 1984
- DEPTH RESOLUTION IN ION SPUTTERING - AN ASPECT OF QUANTITATIVEMICROANALYSISLe Journal de Physique Colloques, 1984
- Analyse de multicouches W/C par spectroscopie d'électrons AugerThin Solid Films, 1983
- A study of interdiffusion in multilayer Cu/Ni films by Auger electron depth profilingThin Solid Films, 1982
- Auger electron spectroscopy depth profiling of Ni/Cr multilayers by sputtering with N2+ ionsThin Solid Films, 1979
- Depth resolution in sputter profilingApplied Physics A, 1977
- Low-Loss Reflection Coatings Using Absorbing MaterialsApplied Physics Letters, 1972
- Chemical Effects in Auger Electron SpectroscopyJournal of Applied Physics, 1972