Investigation of Ge on Si(100) quantum wells by photoelectron spectroscopies

Abstract
In the present work we report on the evolution of the electronic states as a function of Ge overlayer thickness ranging from a fraction of a monolayer to few tens of monolayers. The Ge states above the Si valence band top could be clearly detected at every overlayer thickness d. For d < similar to 6 Angstrom, the Ge state density exhibits a double linear edge. Upon increasing the overlayer thickness the split between the two edges decreases and the double edge structure disappears for d > similar to 6 Angstrom, i.e., at the critical thickness for the transition from strained to unstrained overlayers. For these larger thicknesses, the Ge edge becomes broad and featureless. The energy separation between the Ge onset and the Si valence top increases up to 0.70 eV at larger overlayer thicknesses