The growth and in situ characterization of chemical vapor deposited SiO2
- 1 May 1987
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 83 (2) , 290-296
- https://doi.org/10.1016/0022-0248(87)90020-0
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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