Laser studies of the reactivity of SiO with the surface of a depositing film

This publication has 27 references indexed in Scilit:

• Laser-induced fluorescence of OH and SiO molecules during thermal chemical vapour deposition of SiO2 from silane-oxygen mixtures
  Chemical Physics Letters, 1989
• Laser studies of the reactivity of SiH with the surface of a depositing film
  The Journal of Chemical Physics, 1989
• Effects of Excited Plasma Species on Silicon Oxide Films Formed by Microwave Plasma CVD
  Japanese Journal of Applied Physics, 1989
• Chemiluminescence during thermal chemical vapour deposition of SiO2 from silane-oxygen mixtures
  Chemical Physics Letters, 1988
• I n s i t u measurements of SiO(g) production during dry oxidation of crystalline silicon
  Applied Physics Letters, 1988
• The rate of formation of SiO by the reaction of CO or H2 with silica and silicate slags
  Metallurgical Transactions B, 1985
• Laser detection of diatomic products of plasma sputtering and etching
  Applied Physics Letters, 1984
• Optical emission spectroscopy: Toward the identification of species in the plasma deposition of hydrogenated amorphous silicon alloys
  Solar Cells, 1980
• Silicon chemistry in dense clouds
  Astrophysics and Space Science, 1980
• Discovery of Interstellar Silicon Monoxide
  The Astrophysical Journal, 1971