Laser-induced fluorescence of OH and SiO molecules during thermal chemical vapour deposition of SiO2 from silane-oxygen mixtures
- 3 November 1989
- journal article
- Published by Elsevier in Chemical Physics Letters
- Vol. 163 (1) , 48-54
- https://doi.org/10.1016/0009-2614(89)80009-0
Abstract
No abstract availableKeywords
This publication has 14 references indexed in Scilit:
- Chemiluminescence during thermal chemical vapour deposition of SiO2 from silane-oxygen mixturesChemical Physics Letters, 1988
- Emission from Pulsating Combustion of Silane at a Reduced PressureJapanese Journal of Applied Physics, 1988
- State-selective spectroscopic detection of reaction products (SiH2, Si) in the IR laser decomposition of SiH4Chemical Physics Letters, 1988
- Planar laser-induced fluorescence of OH in a chemically reacting boundary layerApplied Optics, 1988
- Studies of atomic oxygen in O2+CF4 rf discharges by two-photon laser-induced fluorescence and optical emission spectroscopyThe Journal of Chemical Physics, 1986
- The exposure dependence and emission spectrum of chemiluminescence produced during the oxidaton of Si(111) by O2Journal of Electron Spectroscopy and Related Phenomena, 1983
- The Low Lying Electronic States of SiOPhysica Scripta, 1976
- The Spectrum of Molecular OxygenJournal of Physical and Chemical Reference Data, 1972
- Chemisorptive Luminescence: Oxygen on Si(111) SurfacesThe Journal of Chemical Physics, 1971
- The ultraviolet bands of OH Fundamental dataJournal of Quantitative Spectroscopy and Radiative Transfer, 1962