An integration process of micro electro mechanical polysilicon with CMOS analog/digital circuits

This publication has 18 references indexed in Scilit:

• In Situ Phosphorus-doped Polysilicon For Integrated Mems
  Published by Institute of Electrical and Electronics Engineers (IEEE) ,2005
• Properties of polysilicon films annealed by a rapid thermal annealing process
  Thin Solid Films, 1992
• Stress and Microstructure in Phosphorus Doped Polycrystalline Silicon
  MRS Proceedings, 1992
• Process Integration for active polysilicon resonant microstructures
  Sensors and Actuators, 1989
• Fine-grained polysilicon films with built-in tensile strain
  IEEE Transactions on Electron Devices, 1988
• Polycrystalline Silicon for Integrated Circuit Applications
  Published by Springer Nature ,1988
• A new class of integrated sensors with digital output based upon the use of a flip-flop
  IEEE Electron Device Letters, 1986
• A high-yield IC-compatible multichannel recording array
  IEEE Transactions on Electron Devices, 1985
• Polycrystalline Silicon Micromechanical Beams
  Journal of the Electrochemical Society, 1983
• The resonant gate transistor
  IEEE Transactions on Electron Devices, 1967