A new technique for diagnostics of a radio-frequency parallel-plate remote plasma
- 11 July 1994
- journal article
- letter
- Published by AIP Publishing in Applied Physics Letters
- Vol. 65 (2) , 162-164
- https://doi.org/10.1063/1.112659
Abstract
A new parallel‐plate remote plasma reactor was developed, containing a metal grid between the powered and the grounded electrode. Plasma parameters between the grid and a substrate holder have been measured in radio‐frequency (13.56 MHz) argon plasmas using another grid with large surface area as a positive electrostatic probe. The electron density is lower than 106 cm−3 at rf power lower than 10 W; this demonstrates that the plasma is effectively confined. The electron energy distribution function is well approximated to a Maxwellian one. The electron temperature decreases as the pressure increases, and it is lower than 3 eV at pressures above 13.3 Pa, in agreement with electron temperatures in conventional plasmas.Keywords
This publication has 5 references indexed in Scilit:
- High performance poly-crystalline silicon thin film transistors fabricated using remote plasma chemical vapor deposition of SiO/sub 2/IEEE Electron Device Letters, 1994
- Langmuir probe measurements of a radio frequency induction plasmaJournal of Vacuum Science & Technology A, 1993
- Device Quality SiO2 Deposited by Distributed Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition without Substrate HeatingJapanese Journal of Applied Physics, 1992
- Langmuir probe measurements of the electron energy distribution function in radio-frequency plasmasJournal of Vacuum Science & Technology A, 1992
- Evidence for the occurrence of subcutaneous oxidation during low temperature remote plasma enhanced deposition of silicon dioxide filmsJournal of Vacuum Science & Technology A, 1989