The effect of ion current density on the adhesion and structure of coatings deposited by magnetron sputter ion plating
- 1 February 1999
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 112 (1-3) , 177-180
- https://doi.org/10.1016/s0257-8972(98)00790-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- IntroductionPublished by Elsevier ,1991
- High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering systemSurface and Coatings Technology, 1990
- Reactive deposition of hard coatingsSurface and Coatings Technology, 1989
- Activation of reactive sputtering by a plasma beam from an unbalanced magnetronVacuum, 1988
- A magnetron sputter ion plating systemSurface and Coatings Technology, 1988
- Charged particle fluxes from planar magnetron sputtering sourcesJournal of Vacuum Science & Technology A, 1986
- Interface Formation during Thin Film DepositionJournal of Applied Physics, 1963