High-quality polycrystalline silicon thin film prepared by a solid phase crystallization method
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 940-944
- https://doi.org/10.1016/0022-3093(96)00091-9
Abstract
No abstract availableKeywords
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- cw laser anneal of polycrystalline silicon: Crystalline structure, electrical propertiesApplied Physics Letters, 1978
- Morphology of silicon epitaxial layers grown by undercooling of a saturated tin meltJournal of Crystal Growth, 1977