Poly (α-methylstyrene) and α-methylstyrene-maleic anhydride copolymer: an electron beam lithographic study
- 31 August 1984
- Vol. 25 (8) , 1087-1089
- https://doi.org/10.1016/0032-3861(84)90343-4
Abstract
No abstract availableKeywords
This publication has 12 references indexed in Scilit:
- Copolymer electron resists: poly(stryene-methyl methacrylate) copolymersPolymer, 1983
- Poly(methyl methacrylate): influence of tacticity on its use as an electron resistPolymer, 1982
- High Resolution Electron Beam Negative Resist with Very Narrow Molecular Weight DistributionsJournal of the Electrochemical Society, 1982
- Electron‐beam lithography of chlorinated polystyrenes with narrow molecular weight distributionsPolymer Engineering & Science, 1980
- Contrast in the electron-beam lithography of substituted aromatic homopolymers and copolymersJournal of Vacuum Science and Technology, 1979
- Experimental Observations of Nearly Monodisperse Polystyrene as Negative Electron ResistsJournal of the Electrochemical Society, 1979
- Electron irradiation of polymers and its application to resists for electron-beam lithographyCritical Reviews in Solid State and Materials Sciences, 1979
- Relationship of temperature to composition of copolymers of α-methylstyrene and maleic anhydridePolymer, 1976
- A New Family of Positive Electron Beam Resists—Poly(Olefin Sulfones)Journal of the Electrochemical Society, 1973
- Ionic polymerization of mono‐olefinic hydrocarbons at low temperature. Characterization of the alpha‐methylstyrene–sulfuric acid systemJournal of Polymer Science, 1951