Outline and comparison of the possible effects present in a metal–thin–film–insulator–semiconductor
- 1 August 1976
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 47 (8) , 3597-3602
- https://doi.org/10.1063/1.323164
Abstract
The advantages possible with the insertion of a thin-film insulating or semi-insulating layer between a metal and a semiconductor to form MIS photovoltaic device have been presented previously in the literatue. This MIS configuration may be considered as a specific example of a more general class of photovoltaic devices: electrode–thin-film-insulator–semiconductor devices. Since the advantages of the configuration experimental interest in these photovoltaic devices. Because the previous analysis showed that the introduction of the insulator layer could produce several different but advantageous effects, this paper presents a further outline giving a comparison of these effects together with their ramifications.This publication has 7 references indexed in Scilit:
- An Al p-silicon MOS photovoltaic cellJournal of Applied Physics, 1975
- A 15% efficient antireflection-coated metal-oxide-semiconductor solar cellApplied Physics Letters, 1975
- The role of the interfacial layer in metal−semiconductor solar cellsJournal of Applied Physics, 1975
- Minority carrier MIS tunnel diodes and their application to electron- and photo-voltaic energy conversion—II. ExperimentSolid-State Electronics, 1974
- Minority carrier MIS tunnel diodes and their application to electron- and photo-voltaic energy conversion—I. TheorySolid-State Electronics, 1974
- ac properties of biased MIM structuresJournal of Applied Physics, 1974
- Current transport in metal semiconductor contacts—a unified approachSolid-State Electronics, 1972