In-situ growth of YBCO high-Tc superconducting thin films by plasma-enhanced metalorganic chemical vapor deposition
- 1 January 1991
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 107 (1-4) , 699-704
- https://doi.org/10.1016/0022-0248(91)90544-f
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Y-Ba-Cu-O Film Growth by OMCVD Using N2OJapanese Journal of Applied Physics, 1989
- Superconducting films grown i n s i t u by the activated reactive evaporation processApplied Physics Letters, 1989
- Thin Film Growth of YBa2Cu3O7-x by ECR Oxygen Plasma Assisted Reactive EvaporationJapanese Journal of Applied Physics, 1989
- High critical currents in epitaxial YBa2Cu3O7−x thin films on silicon with buffer layersApplied Physics Letters, 1989
- Low-temperature deposition of Y-Ba-Cu-O films on a CaF2/GaAs substrateApplied Physics Letters, 1989
- A parametric investigation of GaAs epitaxial growth uniformity in a high speed, rotating-disk MOCVD reactorJournal of Crystal Growth, 1988
- Y-Ba-Cu-O superconducting films prepared on SrTiO3 substrates by chemical vapor depositionApplied Physics Letters, 1988
- Deposition of superconducting Y-Ba-Cu-O films at 400 °C without post-annealingApplied Physics Letters, 1988
- Growth of ZnO films by the plasma-enhanced metalorganic chemical vapor deposition techniqueJournal of Crystal Growth, 1985
- Diamond synthesis from gas phase in microwave plasmaJournal of Crystal Growth, 1983