Laterally aligned Ge/Si islands: a new concept for faster field-effect transistors
- 1 February 2002
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 89 (1-3) , 101-105
- https://doi.org/10.1016/s0921-5107(01)00810-8
Abstract
No abstract availableKeywords
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