Narrowband laser produced extreme ultraviolet sources adapted to silicon/molybdenum multilayer optics

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Abstract
The extreme ultraviolet radiation emitted from a plasma generated by a pulsed Nd:yttrium aluminum garnet laser is investigated around 13 nm wavelength for several low Z elements (lithium, nitrogen, oxygen, fluorine). A narrowband EUVsource can be designed by using the narrowband line emission of low Z elements in combination with the broadband reflection characteristic of silicon/molybdenum (Si/Mo) multilayer mirrors. Experimental results are discussed within a theoretical model, which allows a deduction of an optimization criterion for a maximum conversion efficiency. The Lyman-α line of hydrogenlike lithium ions fulfills the demands for high intense, free-standing narrowband emission at the long wavelength side of the silicon absorption L edge.