Ion-induced phase formation in metal-silicon systems
- 1 January 1985
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 123 (2) , 135-144
- https://doi.org/10.1016/0040-6090(85)90015-x
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
- Phase formation by ion beam mixing in Ni/Al, Pd/Al, and Pt/Al bilayersApplied Physics Letters, 1983
- Ion mixing and phase diagramsNuclear Instruments and Methods in Physics Research, 1983
- Ion-induced amorphous and crystalline phase formation in Al/Ni, Al/Pd, and Al/Pt thin filmsApplied Physics Letters, 1983
- Formation and Characterization of Transition-Metal SilicidesPublished by Elsevier ,1983
- Ion Mixing of Ni and Pt Layers on SiPhysica Status Solidi (a), 1982
- Ion beam mixing at nickel-silicon interfacesJournal of Applied Physics, 1982
- Production and annealing of ion-bombardment damage in silicides of Pt, Pd, and NiJournal of Applied Physics, 1982
- Ion-beam-induced reactions in metal-semiconductor and metal-metal thin film structuresNuclear Instruments and Methods, 1981
- Channeling studies of radiation damage in metal-silicidesApplied Physics Letters, 1978
- Ion-beam-induced atomic mixingJournal of Applied Physics, 1977