Formation and Characterization of Self-assembled Monolayers of Octadecyltrimethoxysilane on Chromium: Application in Low-Energy Electron Lithography
- 1 January 1998
- journal article
- research article
- Published by American Chemical Society (ACS) in Langmuir
- Vol. 14 (2) , 342-346
- https://doi.org/10.1021/la970438l
Abstract
No abstract availableKeywords
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