Tarnishing of Mo/Si multilayer x-ray mirrors
- 1 December 1993
- journal article
- research article
- Published by Optica Publishing Group in Applied Optics
- Vol. 32 (34) , 6985-6990
- https://doi.org/10.1364/ao.32.006985
Abstract
Optics InfoBase is the Optical Society's online library for flagship journals, partnered and copublished journals, and recent proceedings from OSA conferences.Keywords
This publication has 4 references indexed in Scilit:
- Silicide layer growth rates in Mo/Si multilayersApplied Optics, 1993
- A Soft X-Ray/EUV Reflectometer Based on a Laser Produced Plasma SourceJournal of X-Ray Science and Technology, 1992
- A soft x-ray/EUV reflectometer based on a laser produced plasma sourceJournal of X-Ray Science and Technology, 1992
- Compact scanning soft-x-ray microscope using a laser-produced plasma source and normal-incidence multilayer mirrorsOptics Letters, 1989