Preparation of turbostratic and cubic boron-nitride films by electron-cyclotron-resonance, plasma-assisted, chemical vapour deposition
- 1 December 1994
- journal article
- research article
- Published by Springer Nature in Journal of Materials Science: Materials in Electronics
- Vol. 5 (6) , 324-328
- https://doi.org/10.1007/bf00215567
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- Preparation of Cubic Boron Nitride Films by RF SputteringJapanese Journal of Applied Physics, 1990
- Influence of Atomic Hydrogen on the Formation of Boron Nitride FilmJournal of the Japan Institute of Metals and Materials, 1990
- Preparation of Superconducting YBa2Cu3O7-x Films by ECR Plasma SputteringJapanese Journal of Applied Physics, 1989
- Preparation, properties and applications of boron nitride thin filmsThin Solid Films, 1988
- Density and deposition rate of chemical-vapour-deposited boron nitrideJournal of Materials Science, 1988
- Preparation of Boron Nitride Films by Reactive SputteringJournal of the Japan Institute of Metals and Materials, 1988
- Synthesis and structure of chemically vapour-deposited boron nitrideJournal of Materials Science, 1986
- Boron nitride chemical vapour infiltration of fibrous materials from BCl3NH3H2 or BF3NH3 mixtures: A thermodynamic and experimental approachJournal of the Less Common Metals, 1983
- The interaction of low energy ion beams with surfacesThin Solid Films, 1981
- Preparation of Semiconducting Cubic Boron NitrideThe Journal of Chemical Physics, 1962