Preparation of Superconducting YBa2Cu3O7-x Films by ECR Plasma Sputtering
- 1 January 1989
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 28 (1A) , L88
- https://doi.org/10.1143/jjap.28.l88
Abstract
Y-Ba-Cu-O films were prepared on (100)MgO single crystal substrates by ECR plasma sputtering. As-deposited films without substrate heating were amorphous and electrically insulating. The amorphous film was crystallized to YBa2Cu3O7-x by postannealing at 930°C for 1 min in O2 gas, and the T c of the postannealed film was 70.5 K. The film prepared at the substrate temperature of 650°C was crystalline YBa2Cu3O7-x and the T c of the film without any postannealing was 73 K.Keywords
This publication has 13 references indexed in Scilit:
- Tc of c-Axis-Oriented Y-Ba-Cu-O Films Prepared by CVDJapanese Journal of Applied Physics, 1988
- Low Temperature Preparation of As-Sputtered Superconducting YBaCuO Thin Films by Magnetron SputteringJapanese Journal of Applied Physics, 1988
- Formation of high T c superconducting films by organometallic chemical vapor depositionApplied Physics Letters, 1988
- Single-Crystal YBa2Cu3O7-x Thin Films by Activated Reactive EvaporationJapanese Journal of Applied Physics, 1988
- Single-phase 60-K bulk superconductor in annealed with correlated oxygen vacancies in the Cu-O chainsPhysical Review B, 1987
- Preparation and substrate reactions of superconducting Y-Ba-Cu-O filmsApplied Physics Letters, 1987
- Critical current densities and transport in superconducting YBa2Cu3O7−δ films made by electron beam coevaporationApplied Physics Letters, 1987
- Synthesis of Y-Ba-Cu-O Thin Films on Sapphire Substrates by RF Magnetron SputteringJapanese Journal of Applied Physics, 1987
- High Tc Yb-Ba-Cu-O Thin Films Deposited on Sintered YSZ Substrates by SputteringJapanese Journal of Applied Physics, 1987
- Electron Cyclotron Resonance Plasma Deposition Technique Using Raw Material Supply by SputteringJapanese Journal of Applied Physics, 1984