Preparation, properties and applications of boron nitride thin films
- 29 February 1988
- journal article
- review article
- Published by Elsevier in Thin Solid Films
- Vol. 157 (2) , 267-282
- https://doi.org/10.1016/0040-6090(88)90008-9
Abstract
No abstract availableKeywords
This publication has 57 references indexed in Scilit:
- Low pressure chemical vapor deposition boro-hydro-nitride films and their use in x-ray masksJournal of Vacuum Science & Technology B, 1986
- Stability of alignment marks for x-ray masksJournal of Vacuum Science & Technology B, 1986
- Optical properties of pyrolytic boron nitride in the energy range 0.05—10 eVPhysical Review B, 1984
- Amorphous BN films produced in a double-plasma reactor for semiconductor applicationsSolid-State Electronics, 1983
- Preparation and properties of hard i-C and i-BN coatingsThin Solid Films, 1982
- Preparation and characterization of thin protective films in silica tubes by thermal decomposition of hexachloroborazineJournal of the Less Common Metals, 1981
- Chemical vapour deposition of thin films of BN onto fused silica and sapphireThin Solid Films, 1981
- The deposition of thin films of materials with high melting points on substrates at room temperature using the pulse plasma methodThin Solid Films, 1981
- Boron nitride mask structure for x-ray lithographyJournal of Vacuum Science and Technology, 1979
- Normal Modes in Hexagonal Boron NitridePhysical Review B, 1966