Growth and Characterization of Ferroelectric Pb(Zr,Ti)OM₃ Thin Films by Mocvd Using A 6 Inch Single Wafer Cvd System

This publication has 5 references indexed in Scilit:

• MOCVD growth of BaTiO/sub 3/ in an 8" single-wafer CVD reactor
  Published by Institute of Electrical and Electronics Engineers (IEEE) ,2003
• Compositional control of ferroelectric Pb(Zr,Ti)O/sub 3/ thin films by reactive sputtering and MOCVD
  Published by Institute of Electrical and Electronics Engineers (IEEE) ,2003
• Preparation of Pb(Zr, Ti)O₃ Thin Films Using All Dipivaloylmethane Source Materials by Metalorganic Chemical Vapor Deposition
  Japanese Journal of Applied Physics, 1992
• Metal Complexes for Preparing Ferroelectric Thin Films by Metalorganic Chemical Vapor Deposition
  Japanese Journal of Applied Physics, 1992
• Metalorganic Chemical Vapor Deposition of c-Axis Oriented PZT Thin Films
  Japanese Journal of Applied Physics, 1990