Influence of ion energy, incidence angle and surface roughness on depth resolution in AES sputter profiling of multilayer Cr/Ni thin films
- 1 January 1986
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 18 (1-6) , 655-658
- https://doi.org/10.1016/s0168-583x(86)80105-7
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Auger electron spectroscopy depth profiling during sample rotationSurface and Interface Analysis, 1986
- Determination of depth resolution from measured sputtering profiles of multilayer structures: Equations and approximationsSurface and Interface Analysis, 1986
- Multiple-point depth profiling of multilayer Cr/Ni thin film structures on a rough substrate using scanning auger microscopyThin Solid Films, 1985
- Interface depth resolution of Auger sputter profiled Ni/Cr interfaces: Dependence on ion bombardment parametersJournal of Vacuum Science & Technology A, 1985