Ion beam lithography of polycrystalline CaF2 films deposited on silicon
- 16 December 1989
- journal article
- research article
- Published by Wiley in Physica Status Solidi (a)
- Vol. 116 (2) , 735-743
- https://doi.org/10.1002/pssa.2211160234
Abstract
No abstract availableKeywords
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