Thermal agglomeration of single-crystalline Si layer on buried SiO2 in ultrahigh vacuum
- 1 January 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 20 (1) , 167-172
- https://doi.org/10.1116/1.1431956
Abstract
No abstract availableThis publication has 13 references indexed in Scilit:
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