Chemical and structural analysis of aluminium-oxygen coatings obtained by d.c. magnetron reactive sputtering: some features of the process
- 30 September 1995
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 74-75, 320-325
- https://doi.org/10.1016/0257-8972(95)08239-5
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Pulsed magnetron sputter technologySurface and Coatings Technology, 1993
- Influence of the plasma on substrate heating during low-frequency reactive sputtering of AINJournal of Vacuum Science & Technology A, 1993
- Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputteringSurface and Coatings Technology, 1993
- Microstructural evolution and properties of nanocrystalline alumina made by reactive sputtering depositionThin Solid Films, 1991
- The initial oxidation of aluminum thin films at room temperatureSurface Science, 1972