2K x 8 Bit Hi-CMOS Static RAM's

Abstract
Two Hi-CMOS static RAM's with 2K word by 8 bit organization have been developed. These RAM's are fabricated with single polysilicon technology, which reduces processing costs. A novel J-FET powered static cell formed in the p well is used. The cell area is reduced to 80 percent that of the standard cell. Hi-CMOS well structure gives good immunity to alpha-particle-induced soft errors. These new RAM's have an address access time of 74 ns, an operating power dissipation of 200 mW,and a standby dissipation of 25 /spl mu/W.

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