LPCVD of in-situ doped polycrystalline silicon at high growth rates
- 1 December 1986
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 79 (1-3) , 394-398
- https://doi.org/10.1016/0022-0248(86)90466-5
Abstract
No abstract availableKeywords
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