Semi-insulating polysilicon (SIPOS) deposition in a low pressure CVD reactor: I. Growth kinetics
- 31 December 1981
- journal article
- Published by Elsevier in Journal of Crystal Growth
- Vol. 55 (3) , 485-500
- https://doi.org/10.1016/0022-0248(81)90106-8
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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