Oxidation of silicon in the afterglow of microwave induced plasmas
- 1 October 1987
- journal article
- Published by Elsevier in Applied Surface Science
- Vol. 30 (1-4) , 40-46
- https://doi.org/10.1016/0169-4332(87)90071-7
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
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- Thin Tunnelable Layers of Silicon Dioxide Formed by Oxidation of SiliconJournal of the Electrochemical Society, 1970
- Air Afterglow and Kinetics of Some Reactions of Atomic OxygenThe Journal of Chemical Physics, 1958