Influence of gas supply and filament geometry on the large-area deposition of amorphous silicon by hot-wire CVD
- 1 September 2001
- journal article
- conference paper
- Published by Elsevier in Thin Solid Films
- Vol. 395 (1-2) , 61-65
- https://doi.org/10.1016/s0040-6090(01)01208-1
Abstract
No abstract availableKeywords
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- Production of high-quality amorphous silicon films by evaporative silane surface decompositionJournal of Applied Physics, 1988