Some indications of different film forming radicals in a-Si:H deposition by the glow discharge and thermocatalytic CVD processes
- 1 May 2000
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 266-269, 115-119
- https://doi.org/10.1016/s0022-3093(99)00762-0
Abstract
No abstract availableThis publication has 21 references indexed in Scilit:
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