Hydrogen Interaction with Dislocations in Si
- 24 January 2000
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 84 (4) , 690-693
- https://doi.org/10.1103/physrevlett.84.690
Abstract
An H plasma has a remarkable effect on dislocation mobility in silicon, reducing its activation energy to 1.2 eV. Applying density functional theory to the interactions of H and with the core of the partial dislocation in Si, we have identified a path for motion involving kink formation and migration at hydrogenated core bonds which conforms exactly to the experimentally measured activation energy.
Keywords
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