Highly Conformal Thin Films of Tungsten Nitride Prepared by Atomic Layer Deposition from a Novel Precursor
- 20 June 2003
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 15 (15) , 2969-2976
- https://doi.org/10.1021/cm021772s
Abstract
No abstract availableThis publication has 17 references indexed in Scilit:
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