Experimental study of the growth evolution from random towards a (111) preferential orientation of PVD TiN coatings
- 1 March 1995
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 258 (1-2) , 170-173
- https://doi.org/10.1016/0040-6090(94)06355-9
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Microstructure modification of TiN by ion bombardment during reactive sputter depositionPublished by Elsevier ,2002
- Recent progress in the study of physically vapour-deposited coatings produced by means of highly ionized plasmasSurface and Coatings Technology, 1992
- Texture analysis of martensitic hot-worked tool steel H13 coated with TiN by physical vapour depositionMaterials Science and Engineering: A, 1991
- Unbalanced magnetrons and new sputtering systems with enhanced plasma ionizationJournal of Vacuum Science & Technology A, 1991
- Reactive sputtering of TiN films at large substrate to target distancesVacuum, 1990
- ε-Ti2N phase growth control in titanium nitride filmsThin Solid Films, 1989
- Properties of ion-plated TiN coatings grown at low temperaturesSurface and Coatings Technology, 1988
- Dependence of microstructure of TiN coatings on their thicknessThin Solid Films, 1988
- Morphology and structure of ion-plated TiN, TiC and Ti(C, N) coatingsThin Solid Films, 1984
- TiN and TiC coating on cemented carbides by ion platingThin Solid Films, 1978