High rate deposition of μc-Si with plasma gun CVD
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 935-939
- https://doi.org/10.1016/0022-3093(96)00090-7
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Improvement of grain size and deposition rate of microcrystalline silicon by use of very high frequency glow dischargeApplied Physics Letters, 1994
- High rate deposition of SiO2 on large-scale glass by dc arc plasma enhanced CVDJournal of Non-Crystalline Solids, 1994
- Low-Temperature Growth Process of Polycrystalline Silicon for Thin Film Transistors.SHINKU, 1994