Dynamic quenching of photocapacitance in CdS : Cu evaporated thin films
- 1 January 1979
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 50 (1) , 483-488
- https://doi.org/10.1063/1.325638
Abstract
The effect of the primary light intensity (corresponding to the fundamental absorption edge) on the infrared quenching of photocapacitance (PHCAP IR quenching) in CdS : Cu evaporated films has been studied. Two methods, viz., the two‐beam and three‐beam methods, for PHCAP IR quenching on detecting deep Cu levels are developed. It has been found that PHCAP IR quenching depends on the primary light intensity, that is, the rates for capturing holes into Cu deep acceptor levels [Cu+ levels and (Cu+Cu+) levels] vary as the primary light intensity changes. The experimental results are consistent with the calculations based on the three‐state model of Cu quantitatively. The photoionization cross sections and thermal emission rates of holes were also measured.This publication has 31 references indexed in Scilit:
- Photoionization cross sections in platinum-doped siliconJournal of Applied Physics, 1977
- Bulk and interface imperfections in semiconductorsSolid-State Electronics, 1976
- Photoionization cross sections of a two-electron donor center in siliconPhysical Review B, 1976
- Optical Cross Sections for the Zn-O Center in GaPJapanese Journal of Applied Physics, 1975
- Photocapacitance in the study of nonradiative centersJournal of Luminescence, 1973
- Photocapacitance Studies of the Oxygen Donor in GaP. I. Optical Cross Sections, Energy Levels, and ConcentrationPhysical Review B, 1973
- Photoionization cross sections of holes at zinc centers in siliconJournal of Applied Physics, 1973
- Photocapacitance studies of deep-double-electron-trap oxygen in gallium phosphideApplied Physics Letters, 1972
- Photoionization of Electrons at Sulfur Centers in SiliconJournal of Applied Physics, 1971
- Thermal and optical emission and capture rates and cross sections of electrons and holes at imperfection centers in semiconductors from photo and dark junction current and capacitance experimentsSolid-State Electronics, 1970