Electrical properties of Ti/TiN films prepared by chemical vapor deposition and their applications in submicron structures as contact and barrier materials
- 1 October 1997
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 308-309, 589-593
- https://doi.org/10.1016/s0040-6090(97)00477-x
Abstract
No abstract availableKeywords
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